摘要
The first direct observation of the top view of micromasking film on the Si surface to gate oxidation in the local oxidation of silicon process with transmission electron microscopy (TEM) has been made. The micromasking film looks like an "eyelash" in cross-sectional transmission electron microscopy and like a "black belt" in top view TEM. In addition, direct and sequential TEM observations on the removal of the micromasking film by sacrificial oxidation were presented.
| 原文 | 英語 |
|---|---|
| 頁(從 - 到) | 3810-3813 |
| 頁數 | 4 |
| 期刊 | Journal of Applied Physics |
| 卷 | 75 |
| 發行號 | 8 |
| DOIs | |
| 出版狀態 | 已出版 - 1994 |
| 對外發佈 | 是 |
指紋
深入研究「Transmission electron microscopy analysis of "black belt:" The masking film of white ribbon of Kooi effect in the local oxidation of silicon process」主題。共同形成了獨特的指紋。引用此
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