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Transmission electron microscopy analysis of "black belt:" The masking film of white ribbon of Kooi effect in the local oxidation of silicon process

  • Tan Tsu Sheng*
  • , Chih Yuan Lu
  • , Ruey Dar Chang
  • , Song Tsan Chiang
  • *此作品的通信作者
  • Industrial Technology Research Institute of Taiwan

研究成果: 期刊稿件文章同行評審

2 引文 斯高帕斯(Scopus)

摘要

The first direct observation of the top view of micromasking film on the Si surface to gate oxidation in the local oxidation of silicon process with transmission electron microscopy (TEM) has been made. The micromasking film looks like an "eyelash" in cross-sectional transmission electron microscopy and like a "black belt" in top view TEM. In addition, direct and sequential TEM observations on the removal of the micromasking film by sacrificial oxidation were presented.

原文英語
頁(從 - 到)3810-3813
頁數4
期刊Journal of Applied Physics
75
發行號8
DOIs
出版狀態已出版 - 1994
對外發佈

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