Transparent resistive random access memory (TRRAM) based on Gd 2O3 film and its resistive switching characteristics

Kou Chen Liu*, Wen Hsien Tzeng, Kow Ming Chang, Yi Chun Chan, Chun Chih Kuo, Chun Wen Cheng

*此作品的通信作者

研究成果: 圖書/報告稿件的類型會議稿件同行評審

4 引文 斯高帕斯(Scopus)

摘要

A transparent resistive random access memory (T-RRAM) based on ITO/Gd 2O3/ITO capacitor structure is successfully fabricated on Glass substrate by pulse laser deposition (PLD) at room temperature. Under bipolar operation, the ITO/Gd2O3/ITO device exhibits reliable and stable resistive switching behaviors for more than 200 switching cycles and low operation voltage of -2V/+2V. Furthermore, our device demonstrates nonpolar resistive switching characteristic which exhibits high potential to be applied for the next generation nonvolatile memory.

原文英語
主出版物標題INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings
頁面898-899
頁數2
DOIs
出版狀態已出版 - 2010
事件2010 3rd International Nanoelectronics Conference, INEC 2010 - Hongkong, 中國
持續時間: 03 01 201008 01 2010

出版系列

名字INEC 2010 - 2010 3rd International Nanoelectronics Conference, Proceedings

Conference

Conference2010 3rd International Nanoelectronics Conference, INEC 2010
國家/地區中國
城市Hongkong
期間03/01/1008/01/10

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