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Very high density RF MIM capacitor compatible with VLSI

  • K. C. Chiang*
  • , C. H. Lai
  • , Albert Chin
  • , H. L. Kao
  • , S. P. McAlister
  • , C. C. Chi
  • *此作品的通信作者
  • National Yang Ming Chiao Tung University
  • National University of Singapore
  • National Research Council of Canada
  • National Tsing Hua University

研究成果: 圖書/報告稿件的類型會議稿件同行評審

13 引文 斯高帕斯(Scopus)

摘要

We have fabricated RF MEM capacitors, using high-κ TiTaO as the dielectric, which show a record high density of 20 fF/μm 2. In addition, the capacitors display a small capacitance reduction of only 3.6% over the 100 kHz to 20 GHz range, a low leakage current of 8 pF and a high Q of 120. This was for a typical large 8 pF TiTaO MIM capacitor. The small voltage dependence of the capacitance (ΔC/C) of 770 ppm at 2 GHz, shows that these MIM capacitors are useful for high-precision RF circuits.

原文英語
主出版物標題2005 IEEE MTT-S International Microwave Symposium Digest
頁面287-290
頁數4
DOIs
出版狀態已出版 - 2005
對外發佈
事件2005 IEEE MTT-S International Microwave Symposium - Long Beach, CA, 美國
持續時間: 12 06 200517 06 2005

出版系列

名字IEEE MTT-S International Microwave Symposium Digest
2005
ISSN(列印)0149-645X

Conference

Conference2005 IEEE MTT-S International Microwave Symposium
國家/地區美國
城市Long Beach, CA
期間12/06/0517/06/05

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